100-Picometer Interferometry for EUVL
Description:
Future extreme ultraviolet lithography (EWL) steppers will, in all likelihood, have six-mirror projection cameras. To operate at the diffraction limit over an acceptable depth of focus each aspheric mirror will have to be fabricated with an absolute figure accuracy approaching 100 pm rms. We are currently developing visible light interferometry to meet this need based on modifications of our present phase shifting diffraction interferometry (PSDI) methodology where we achieved an absolute accur…
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Date:
March 18, 2002
Creator:
Sommargren, G. E.; Phillion, D. W.; Johnson, M. A.; Nguyen, N. O.; Barty, A.; Snell, F. J. et al.
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