Development of novel boron-based multilayer thin-film. Semi-annual report for December 15, 1998 to June 15, 1999

PDF Version Also Available for Download.

Description

In the past six months, this project was focused on more fundamental studies of the coating properties. The properties of each individual coating TiB{sub 2}, TiBC as well as the alternating TiB{sub 2}/TiBC laminates were studied. These properties include residual stress, surface morphology and topography, adhesion and wear rate. The coatings were deposited using dc magnetron reactive sputtering process. Deposition of the films was carried out in a production-scale, three-chamber-in-line coating system, consisting of a load-lock chamber, and two deposition chambers. The substrates were cleaned and mounted on a rack before going into the chamber. A computerized conveyor system transported … continued below

Physical Description

8 p.

Creation Information

Nieh, Simon August 2, 1999.

Context

This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by the UNT Libraries Government Documents Department to the UNT Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 131 times. More information about this report can be viewed below.

Who

People and organizations associated with either the creation of this report or its content.

Author

Sponsor

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this report. Follow the links below to find similar items on the Digital Library.

Titles

Description

In the past six months, this project was focused on more fundamental studies of the coating properties. The properties of each individual coating TiB{sub 2}, TiBC as well as the alternating TiB{sub 2}/TiBC laminates were studied. These properties include residual stress, surface morphology and topography, adhesion and wear rate. The coatings were deposited using dc magnetron reactive sputtering process. Deposition of the films was carried out in a production-scale, three-chamber-in-line coating system, consisting of a load-lock chamber, and two deposition chambers. The substrates were cleaned and mounted on a rack before going into the chamber. A computerized conveyor system transported the rack into the load-lock chamber, where the pressure was pumped down to around 2E-5 torr. The substrates were then preheated by an infrared heater to about 100 C. After preheating, the substrates were transported into the first deposition chamber through a gate valve. The base pressure of the deposition chambers is 2E-6 torr. A layer of Ti was deposited on the substrates using two 5 inch x 20 inch Ti targets in the first deposition chamber as the adhesion layer. The substrates were then transported to the second deposition chamber for the TiB{sub 2} and Ti-B-C-N depositions. In the second deposition chamber, two 5 inch x 20 inch TiB{sub 2} targets were mounted on both sides. For the TiB{sub 2} deposition, argon was introduced into the chamber. For the Ti-B-C-N deposition, acetylene and nitrogen were introduced into the chamber through four gas distribution manifolds to insure the uniformity. The partial pressure of the reactive gases were controlled by a PID control loop. Substrate bias is one of the key deposition parameters. Bias voltages ranged from 40 to 300V. Current density is around 2 mA/cm{sup 2}. The deposition rate is about 1.5 {micro}m/hr. All the test coatings, used for thickness and hardness measurement, as well as, microstructural studies, were deposited on polished 001 silicon wafers. All the coatings used for wear tests, were deposited on polished 1 inch stainless steel 316 disks.

Physical Description

8 p.

Notes

OSTI as DE00762805

Medium: P; Size: 8 pages

Source

  • Other Information: PBD: 2 Aug 1999

Language

Item Type

Identifier

Unique identifying numbers for this report in the Digital Library or other systems.

Collections

This report is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

What responsibilities do I have when using this report?

When

Dates and time periods associated with this report.

Creation Date

  • August 2, 1999

Added to The UNT Digital Library

  • Sept. 29, 2015, 5:31 a.m.

Description Last Updated

  • July 1, 2019, 2:17 p.m.

Usage Statistics

When was this report last used?

Yesterday: 0
Past 30 days: 1
Total Uses: 131

Interact With This Report

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

International Image Interoperability Framework

IIF Logo

We support the IIIF Presentation API

Nieh, Simon. Development of novel boron-based multilayer thin-film. Semi-annual report for December 15, 1998 to June 15, 1999, report, August 2, 1999; United States. (https://digital.library.unt.edu/ark:/67531/metadc719591/: accessed May 30, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.

Back to Top of Screen