Methods for fabricating arrays of holes using interference lithography
Description:
Optical interference lithography offers a robust patterning technology capable of achieving high spatial resolution over extremely large field sizes ( {approx}1 m ). Here, we compare two different approaches for fabricating arrays of holes using interferometric techniques. We show that by applying an image reversal process to standard two-beam interference lithography, arrays of high aspect ratio holes can be generated. This process scales to submicron periods and allows holes as small as 0.1 m…
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Date:
May 28, 1997
Creator:
Fernandez, A.; Decker, J. Y.; Herman, S. M.; Phillion, D. W.; Sweeney, D. W. & Perry, M. D.
Partner:
UNT Libraries Government Documents Department