Test masks for the experimental evaluation of automated IC photomask inspection systems
Description:
The design and fabrication of a test mask suitable for the experimental evaluation of automated integrated circuit photomask inspection systems is described. This mask contains various types and sizes of intentional defects in known locations. The defects are superimposed on a background of images consisting of a typical integrated circuit pattern.
Date:
May 24, 1976
Creator:
Ciarlo, D. R.
Item Type:
Refine your search to only
Report
Partner:
UNT Libraries Government Documents Department