Ion Beam Deposition of (NbTa)2O5/SiO2 Multilayers for High-Efficiency Dielectric Gratings for High Average Power Laser Systems Operating at 800 nm Central Wavelength
Description:
The ion beam deposition of (NbTa)2O5 has been investigated for realizing high reflectance multilayer stacks of high damage threshold for applications in the engineering of dielectric gratings for use at 800 nm. Deposition conditions were optimized to yield fully oxidized films as determined from x-ray photoelectron spectroscopy (XPS). The film properties were also investigated using spectroscopic ellipsometry, and spectrophotometry to determine their refractive index and thickness respectively.…
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Date:
June 2, 2006
Creator:
Menoni, C. S.; Patel, D.; Brizuela, F.; Rocca, J. J.; Nguyen, H. T. & Britten, J. A.
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