Potential energy sputtering of EUVL materials
Description:
Of the many candidates employed for understanding the erosion of critical Extreme Ultraviolet Lithography (EUVL) components, potential energy damage remains relatively uninvestigated. Unlike the familiar kinetic energy sputtering, which is a consequence of the momentum transferred by an ion to atoms in the target, potential energy sputtering occurs when an ion rapidly collects charge from the target as it neutralizes. Since the neutralization energy of a singly charged ion is typically on the o…
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Date:
July 2, 2004
Creator:
Pomeroy, J. M.; Ratliff, L. P.; Gillaspy, J. D. & Bajt, S.
Partner:
UNT Libraries Government Documents Department